Valid from: Autumn 2014
Decided by: FN1/Anders Gustafsson
Date of establishment: 2014-04-22
Division: Solid State Physics
Course type: Course given jointly for second and third cycle
The course is also given at second-cycle level with course code: FAFN15
Teaching language: English
Epitaxy is a method to fabricate crystalline materials, which is very common in the electronics industry. The aim of the course is to give the doctoral student a background that is relevant to research in crystal growth and epitaxy and to provide the knowledge necessary to discuss problems in crystal growth and epitaxy.
Knowledge and Understanding
For a passing grade the doctoral student must
Competences and Skills
For a passing grade the doctoral student must
In this course we will carefully treat the fundamental aspects of crystal growth. We will study the thermodynamic prerequisites for crystal growth, such as chemical potential, construction of binary phase diagrams, supersaturation, and nucleation. Further on, we will discuss surface energies, surface diffusion, and Wulff’s theorem. In the course section on epitaxial growth we will discuss surface reconstructions, lattice mismatch, and dislocations, as well as characterization – both in- and ex-situ. We will also deal with growth techniques and reactor models. During the course, the various moments will be illuminated by examples from modern research, especially research on epitaxy of nanostructures.
Pohl, U.: Epitaxy of Semiconductors. Springer, 2013. ISBN 9783642329692.
Types of instruction: Lectures, exercises
Examination format: Written exam
Grading scale: Failed, pass
Examiner:
Assumed prior knowledge: FFF110 Processing and Device Technology, a basic course in thermodynamics and materials science.
Course coordinators:
Web page: http://www.ftf.lth.se/education/elective_courses/